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Magnesium Silicide (Mg2Si)-Sputtering Target

Magnesium Silicide (Mg2Si)-Sputtering Target

Molecular Formula: Mg2Si</br>Purity: 99.9%</br>Products Code: TR121400ST</br>Specification Model: 4 inch dia x 0.25 inch th.etc</br>Hazardous Class: Class 4.3</br>EINECS No.: 245-254-5</br>UN No.: UN2624</br>CAS: 22831-39-6</br>Package Class: PGII
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Magnesium Silicide (Mg2Si)-Sputtering Target introduce:


Magnesium silicide, Mg2Si, is an inorganic compound consisting of magnesium and silicon.Mg2Si is the only stable compound of mg-si binary system. It has the characteristics of high melting point, high hardness and high elastic modulus. It is a kind of n-type semiconductor material with narrow band gap.

Chemical formula:Mg2Si

Molar mass:76.695 g·mol−1

Appearance:Gray cubic crystals

Density:1.99 g/cm3

Melting point:1102 °C (2,016 °F; 1,375 K)

Solubility in water: reacts

Crystal structure:Cubic, cF12


Magnesium silicide is commonly used in the production of aluminum alloys. This alloy contains about 1.5% magnesium silicide, which has the characteristics of aging and hardening, forming the guinier-preston region and very uniform precipitation, which can improve the strength of the alloy.

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