Titanium Silicide (TiSi2)-Sputtering Target

Characteristic

 

Titanium disilicide (TiSi2) is an inorganic chemical compound.




Chemical formula：TiSi2

Molar mass：104.038 g/mol

Appearance：black orthorhombic crystals

Density：4.02 g/cm3

Melting point：1,470 °C (2,680 °F; 1,740 K)

Solubility in water：insoluble

Solubility： soluble in HF

 


Application

 

Titanium silicide is used in the semiconductor industry. It is typically grown by means of salicide technology over silicon and polysilicon lines to reduce the sheet resistance of local transistors connections. In the microelectronic industry it is typically used in the C54 phase.