Zinc Aluminum Alloy (ZnAl (98:2 wt%))-Sputtering Target
Terbium(III) sulfate octahydrate (Tb2(SO4)3•8H2O)-Crystalline
Gallium Iodide (GaI3)-Powder
Ammonium tetrafluoroborate (NH4BF4)-Powder
Tungsten Titanium (WTi (90:10 wt%))-Sputtering Target
Scandium metal (Sc)-Ingot
.jpg "Tellurium Oxide (TeO2)-Sputtering Target")
.jpg "Zinc Aluminum Alloy (ZnAl (98:2 wt%))-Sputtering Target")
.jpg "Terbium(III) sulfate octahydrate (Tb2(SO4)3•8H2O)-Crystalline")
.jpg "Gallium Iodide (GaI3)-Powder")
.jpg "Ammonium tetrafluoroborate (NH4BF4)-Powder")
.jpg "Tungsten Titanium (WTi (90:10 wt%))-Sputtering Target")
.jpg "Scandium metal (Sc)-Ingot")
